Implications of X-ray thermal diffuse scattering in integrated Bragg intensities of silicon and cubic boron nitride
Research output: Contribution to journal › Journal article › Research › peer-review
| Original language | English |
|---|---|
| Journal | Journal of Applied Crystallography |
| Volume | 50 |
| Pages (from-to) | 1791-1799 |
| ISSN | 1600-5767 |
| DOIs | |
| Publication status | Published - Dec 2017 |
- thermal diffuse scattering, Debye-Waller factors, ab initio calculations, charge-density studies
Research areas
ID: 193503053